Data | Título | Autor(es) | Tipo | Acesso |
3-Set-2015 | Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters | Cristea, D.; Pătru, M.; Crisan, A., et al. | Artigo | Acesso restrito UMinho |
25-Jun-2013 | Development of tantalum oxynitride thin films produced by PVD: study of structural stability | Cristea, D.; Crisan, A.; Barradas, N. P., et al. | Artigo | Acesso restrito UMinho |
2013 | Electrical and photocatalytic behaviour of TAOxNy magnetron sputtered thin solid films | Cristea, D.; Crisan, A.; Barradas, N. P., et al. | Artigo | Acesso restrito UMinho |
Dez-2013 | Properties of tantalum oxynitride thin films produced by magnetron sputtering: the influence of processing parameters | Cristea, D.; Constantin, D. G.; Crisan, A., et al. | Artigo | Acesso restrito UMinho |
10-Jul-2015 | Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering | Cristea, D.; Crisan, A.; Cretu, N., et al. | Artigo | Acesso restrito UMinho |
2014 | Tantalum oxynitride thin films: mechanical properties and wear behavior dependence on growth conditions | Cristea, D.; Crisan, A.; Munteanua, D., et al. | Artigo | Acesso restrito UMinho |