Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/39767

TitleComposition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters
Author(s)Cristea, D.
Pătru, M.
Crisan, A.
Munteanu, D.
Crăciun, D.
Barradas, N. P.
Alves, E.
Apreutesei, M.
Moura, C.
Cunha, L.
KeywordsTantalum oxynitride
Sputtering
SEM
RBS
Structure
Issue date3-Sep-2015
PublisherElsevier
JournalApplied Surface Science
CitationCristea, D., Pătru, M., Crisan, A., Munteanu, D., Crăciun, D., Barradas, N. P., . . . Cunha, L. (2015). Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters. Applied Surface Science. doi: 10.1016/j.apsusc.2015.09.022
Abstract(s)Tantalum oxynitride thin films were produced by magnetron sputtering. The films were deposited usinga pure Ta target and a working atmosphere with a constant N2/O2ratio. The choice of this constant ratiolimits the study concerning the influence of each reactive gas, but allows a deeper understanding of theaspects related to the affinity of Ta to the non-metallic elements and it is economically advantageous.This work begins by analysing the data obtained directly from the film deposition stage, followed bythe analysis of the morphology, composition and structure. For a better understanding regarding theinfluence of the deposition parameters, the analyses are presented by using the following criterion: thefilms were divided into two sets, one of them produced with grounded substrate holder and the otherwith a polarization of −50 V. Each one of these sets was produced with different partial pressure of thereactive gases P(N2+ O2). All the films exhibited a O/N ratio higher than the N/O ratio in the depositionchamber atmosphere. In the case of the films produced with grounded substrate holder, a strong increaseof the O content is observed, associated to the strong decrease of the N content, when P(N2+ O2) is higherthan 0.13 Pa. The higher Ta affinity for O strongly influences the structural evolution of the films. Grazingincidence X-ray diffraction showed that the lower partial pressure films were crystalline, while X-rayreflectivity studies found out that the density of the films depended on the deposition conditions: thehigher the gas pressure, the lower the density. Firstly, a dominant -Ta structure is observed, for lowP(N2+ O2); secondly a fcc-Ta(N,O) structure, for intermediate P(N2+ O2); thirdly, the films are amorphousfor the highest partial pressures. The comparison of the characteristics of both sets of produced TaNxOyfilms are explained, with detail, in the text.
TypeArticle
URIhttp://hdl.handle.net/1822/39767
DOI10.1016/j.apsusc.2015.09.022
ISSN0169-4332
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0169433215021133
Peer-Reviewedyes
AccessRestricted access (UMinho)
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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