Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/64836

TitleAtmospheric pressure plasma deposition of organosilicon thin films by direct current and radio-frequency plasma jets
Author(s)Kuchakova, Iryna
Ionita, Maria Daniela
Ionita, Eusebiu-Rosini
Lazea-Stoyanova, Andrada
Brajnicov, Simona
Mitu, Bogdana
Dinescu, Gheorghe
De Vrieze, Mike
Cvelbar, Uroš
Zille, Andrea
Leys, Christophe
Yu Nikiforov, Anton
Keywordsplasma deposition
atmospheric pressure plasma
thin film
organosilicon films
organosilicon precursors
Issue date13-Mar-2020
PublisherMDPI
JournalMaterials
CitationKuchakova, I.; Ionita, M.D.; Ionita, E.-R.; Lazea-Stoyanova, A.; Brajnicov, S.; Mitu, B.; Dinescu, G.; De Vrieze, M.; Cvelbar, U.; Zille, A.; Leys, C.; Yu Nikiforov, A. Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets. Materials 2020, 13, 1296.
Abstract(s)Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a challenge. The two types of atmospheric-pressure plasma depositions of organosilicon films by the direct and indirect injection of hexamethyldisiloxane (HMDSO) precursor into a plasma region were chosen and compared in terms of the films chemical composition and morphology to address this. Although different methods of plasma excitation were used, the deposition of inorganic films with above 98% of SiO2 content was achieved for both cases. The chemical structure of the films was insignificantly dependent on the substrate type. The deposition in the afterglow of the DC discharge resulted in a soft film with high roughness, whereas RF plasma deposition led to a smoother film. In the case of the RF plasma deposition on polymeric materials resulted in films with delamination and cracks formation. Lastly, despite some material limitations, both deposition methods demonstrated significant potential for SiOx thin-films preparation for a variety of bio-related substrates, including glass, ceramics, metals, and polymers.
TypeArticle
URIhttp://hdl.handle.net/1822/64836
DOI10.3390/ma13061296
Publisher versionhttps://www.mdpi.com/1996-1944/13/6/1296
Peer-Reviewedyes
AccessOpen access
Appears in Collections:DET/2C2T - Artigos em revistas internacionais com arbitragem científica

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