Control of the deposition ratio of Bi2Te3 and Sb2Te3 in a vacuum evaporator for fabrication of Peltier elements

doi:10.1109/ISIE.2006.296053

Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/5559

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Campo DC	Valor	Idioma
dc.contributor.author	Gonçalves, L. M.	-
dc.contributor.author	Rocha, J. G.	-
dc.contributor.author	Correia, J. H.	-
dc.contributor.author	Couto, Carlos	-
dc.date.accessioned	2006-09-15T15:46:50Z	-
dc.date.available	2006-09-15T15:46:50Z	-
dc.date.issued	2006	-
dc.identifier.citation	IEEE INTERNATIONAL SYMPOSIUM ON INDUSTRIAL ELECTRONICS, Québec, Canada, 2006 – “ISIE 2006 : proceedings”. [S.l.] : IEEE, 2006. ISBN 1-4244-0497-5. p. 2773-2777.	eng
dc.identifier.isbn	1-4244-0497-5	-
dc.identifier.uri	https://hdl.handle.net/1822/5559	-
dc.description.abstract	This article reports the main problem and the corresponding solution of the co-evaporation of Bi2Te3 and Sb2Te3 films for the fabrication of Peltier elements. This main problem consists in the control of the deposition rates of the two elements: Bi or Sb and Te, which have very different vapor pressures. The control of the deposition ratio was achieved by means of a PID controller, which permitted the fabrication of thin-film Peltier elements that produce a temperature gradient in the order of 2C between their hot and cold junctions, when measured at free air conditions.	eng
dc.description.sponsorship	Fundação para a Ciência e a Tecnologia (FCT) - SFRH/BD/18142/2004.	por
dc.description.sponsorship	Agencia de Inovação (MPYROM).	por
dc.language.iso	eng	eng
dc.publisher	IEEE	eng
dc.rights	openAccess	eng
dc.subject	Co-evaporation	eng
dc.subject	Compound	eng
dc.subject	Deposition rate	eng
dc.subject	PID	eng
dc.subject	Peltier	eng
dc.subject	Bismuth Telluride	eng
dc.title	Control of the deposition ratio of Bi2Te3 and Sb2Te3 in a vacuum evaporator for fabrication of Peltier elements	eng
dc.type	conferencePaper	eng
dc.peerreviewed	yes	eng
oaire.citationStartPage	2773	por
oaire.citationEndPage	+	por
dc.identifier.doi	10.1109/ISIE.2006.296053	por
dc.subject.wos	Science & Technology	por
sdum.bookTitle	2006 IEEE INTERNATIONAL SYMPOSIUM ON INDUSTRIAL ELECTRONICS, VOLS 1-7	por
Aparece nas coleções:	DEI - Artigos em atas de congressos internacionais

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