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https://hdl.handle.net/1822/49952
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Campo DC | Valor | Idioma |
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dc.contributor.author | Cristea, D. | por |
dc.contributor.author | Cunha, Luís | por |
dc.contributor.author | Crișan, A. | por |
dc.contributor.author | Munteanu, D. | por |
dc.date.accessioned | 2018-02-01T09:03:15Z | - |
dc.date.issued | 2015 | - |
dc.identifier.citation | D. Cristea, L. Cunha, A. Crisan, D. Munteanu, OVERVIEW ON MAGNETRON SPUTTERED TANTALUMOXYNITRIDE THIN FILMS – STRUCTURES AND PROPERTIES, thenomus journal No 22 (2015) 185-190 | por |
dc.identifier.issn | 1224-029X | - |
dc.identifier.uri | https://hdl.handle.net/1822/49952 | - |
dc.description.abstract | This paper aims to present the results concerning the structural characterization and some of the properties of magnetron sputtered tantalum oxynitride thin films. Tantalum oxynitride thin films have been deposited by sputtering, using as reactive gas a mixture of fixed proportion (17:3) composed of N2 and O2. The main variable parameter during the deposition process has been the overall flow of the reactive gas mixture. A secondary variable parameter has been the polarization voltage (grounded – GND and -50V, respectively). Thus, two sets of samples (Series 1 - -50V and Series 2 – GND) with varying flows have been obtained. The structural characterization, evaluated by X-ray Diffraction, has shown that the films are, for low flows of reactive gas, crystalline in nature. The raising of the reactive gas flow leads to the formation of quasi-amorphous films. The exhibited properties were shown to be closely related to the structural evolution of the films. | por |
dc.description.sponsorship | This paper was supported by the Sectoral Operational Programme Human Resources Development (SOP HRD), ID134378 financed from the European Social Fund and by the Romanian Government. | por |
dc.language.iso | eng | por |
dc.publisher | Stefan cel Mare University of Suceava (USV). Faculty of Mechanical Engineering, Mechatronics and Management | por |
dc.rights | restrictedAccess | por |
dc.subject | Tantalum thin films | por |
dc.subject | Sputtering | por |
dc.subject | Structural evolution | por |
dc.title | Overview on magnetron sputtered tantalum oxynitride thin films – structures and properties | por |
dc.type | conferencePaper | por |
dc.peerreviewed | no | por |
oaire.citationStartPage | 185 | por |
oaire.citationEndPage | 190 | por |
oaire.citationIssue | 22 | - |
oaire.citationConferencePlace | Stefan cel Mare University of Suceava (Romania) | por |
dc.subject.fos | Engenharia e Tecnologia::Engenharia dos Materiais | por |
dc.description.publicationversion | info:eu-repo/semantics/publishedVersion | por |
sdum.journal | Tehnomus Journal | - |
sdum.conferencePublication | New Technologies and Products in Machine Manufacturinh Tecnologies | por |
Aparece nas coleções: | CDF - GRF - Outros Documentos/Other Documents (without refereeing) CECS - Comunicações / Communications |
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Articol Tehnomus - Dan CRISTEA.pdf Acesso restrito! | 609,09 kB | Adobe PDF | Ver/Abrir |