Utilize este identificador para referenciar este registo: http://hdl.handle.net/1822/27575

TítuloStructural evolution of Ti-Al-Si-N nanocomposite coating
Autor(es)Carvalho, S.
Rebouta, L.
Ribeiro, E.
Vaz, F.
Tavares, C. J.
Alves, E.
Barradas, N. P.
Rivière, J. P.
Superhard nanocomposites
Solid solution hardening
Magnetron sputtering
Resumo(s)Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, using a wide range of different deposition conditions, which created conditions to obtain Ti–Al–Si–N coatings with different structural arrangements. Films prepared below a critical nitrogen flow, under conditions out of thermodynamic equilibrium, revealed a preferential growth of an fcc (Ti,Al,Si)Nx compound with a small N deficiency. With nitrogen flow above that critical value, the reduction of the lattice parameter was no longer detected. However, a thermal annealing showed that a complete thermodynamically driven segregation of the TiN and Si3N4 phases was not yet obtained. The segregation upon annealing induced a self-hardening and showed a multiphase system, where the crystalline TiN, (Ti,Al)N and (Ti,Al,Si)Nx phases were identified by X-ray diffraction. This behavior is due to the de-mixing of the solid solution associated to a small N deficiency.
Arbitragem científicayes
Aparece nas coleções:CDF - GRF - Artigos/Papers (with refereeing)

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