Utilize este identificador para referenciar este registo: http://hdl.handle.net/1822/27575

TítuloStructural evolution of Ti-Al-Si-N nanocomposite coating
Autor(es)Carvalho, S.
Rebouta, L.
Ribeiro, E.
Vaz, F.
Tavares, C. J.
Alves, E.
Barradas, N. P.
Rivière, J. P.
Palavras-chaveTi-Al-Si-N
Superhard nanocomposites
Solid solution hardening
Magnetron sputtering
Data2009
EditoraElsevier
RevistaVacuum
Resumo(s)Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, using a wide range of different deposition conditions, which created conditions to obtain Ti–Al–Si–N coatings with different structural arrangements. Films prepared below a critical nitrogen flow, under conditions out of thermodynamic equilibrium, revealed a preferential growth of an fcc (Ti,Al,Si)Nx compound with a small N deficiency. With nitrogen flow above that critical value, the reduction of the lattice parameter was no longer detected. However, a thermal annealing showed that a complete thermodynamically driven segregation of the TiN and Si3N4 phases was not yet obtained. The segregation upon annealing induced a self-hardening and showed a multiphase system, where the crystalline TiN, (Ti,Al)N and (Ti,Al,Si)Nx phases were identified by X-ray diffraction. This behavior is due to the de-mixing of the solid solution associated to a small N deficiency.
Tipoarticle
URIhttp://hdl.handle.net/1822/27575
DOI10.1016/j.vacuum.2009.03.009
ISSN0042-207X
Arbitragem científicayes
AcessoopenAccess
Aparece nas coleções:CDF - GRF - Artigos/Papers (with refereeing)

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