Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/27167

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dc.contributor.authorCristea, D.-
dc.contributor.authorCrisan, A.-
dc.contributor.authorBarradas, N. P.-
dc.contributor.authorAlves, E.-
dc.contributor.authorCosta, P.-
dc.contributor.authorLanceros-Méndez, S.-
dc.contributor.authorCunha, L.-
dc.date.accessioned2013-12-18T15:13:09Z-
dc.date.available2013-12-18T15:13:09Z-
dc.date.issued2013-
dc.identifier.citationMetalurgia International vol. XVIII (2013) Special Issue no. 6por
dc.identifier.issn1582-2214por
dc.identifier.urihttp://hdl.handle.net/1822/27167-
dc.description.abstractTantalum oxynitride thin films were deposited by reactive magnetron sputtering in a N2+O2 (85%+15%) atmosphere, with increasing total reactive gas flows. The chemical composition was determined by RBS and the structural development by XRD. The electrical resistivity was measured using the 2-point and 4-point probe techniques. The photocatalytic behavior was determined on glass samples in UV, using methylene-blue as a pollutant. It was observed that, depending on the deposition process parameters, the samples can be divided into 4 zones, each with a characteristic structure and subsequent behavior. The samples from zone I can be attributed to the β-Ta phase, metallic, conductive. The samples from zone II can be attributed to a fcc Ta(O, N) structure, with N/Ta higher than O/Ta, with increasing electrical resistivity. The samples from zone III are oxide-like, amorphous, electrically insulating.por
dc.description.sponsorshipFEDER through the COMPETE Program and by the Portuguese Foundation for Science and Technology (FCT) in the framework of the Strategic Project PEST-C/FIS/UI607/2011por
dc.description.sponsorshipSectoral Operation Programme Human Resources Development (SOP HRD), ID76945 financed from the European Social Fund and by the Romanian Government.por
dc.language.isoengpor
dc.publisherEditura Stiintifica FMRpor
dc.rightsrestrictedAccesspor
dc.subjectTantalum oxynitridepor
dc.subjectSputteringpor
dc.subjectThin filmspor
dc.titleElectrical and photocatalytic behaviour of TAOxNy magnetron sputtered thin solid filmspor
dc.typearticlepor
dc.peerreviewedyespor
sdum.publicationstatuspublishedpor
oaire.citationStartPage61por
oaire.citationEndPage64por
oaire.citationIssueSpecial Issue 6por
oaire.citationTitleMetalurgia Internationalpor
oaire.citationVolumeXVIIIpor
dc.subject.wosScience & Technologypor
sdum.journalMetalurgia Internationalpor
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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