Please use this identifier to cite or link to this item: https://hdl.handle.net/1822/19105

TitleStudy on pulsed DC-sputtering of iridium oxide for implantable electrodes
Author(s)Dias, N. S.
Silva, A. F.
Van Ooyen, A.
Mendes, P. M.
Afonso, José A.
Correia, J. H.
Mokwa, W.
Schnakenberg, U.
KeywordsIrOx Sputtering
Implantable electrodes
Issue date2007
Abstract(s)A pulsed-DC reactive sputtering technique was used for iridium oxide thin-film deposition. Frequency, pulse width, oxygen flow and deposition time were changed over several deposition sessions, regarding implantable electrode applications. Surface and electrochemistry analysis were performed for deposition evaluation. The results evidenced that the deposited film sputtered with 2 sccm of oxygen flow and 50 KHz pulse frequency, achieved best surface structure and electrochemical properties. Impedance tests revealed an almost purely resistive behaviour for stimulation signal frequencies 0.1-10 KHz, with a value of 150 Ω
TypeConference paper
URIhttps://hdl.handle.net/1822/19105
Peer-Reviewedyes
AccessRestricted access (UMinho)
Appears in Collections:CAlg - Artigos em livros de atas/Papers in proceedings
DEI - Artigos em atas de congressos internacionais

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