Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13766

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dc.contributor.authorThaiyalnayaki, V.-
dc.contributor.authorCerqueira, M. F.-
dc.contributor.authorFerreira, J. A.-
dc.contributor.authorTovar, J.-
dc.date.accessioned2011-10-04T16:04:58Z-
dc.date.available2011-10-04T16:04:58Z-
dc.date.issued2008-
dc.identifier.issn0042-207Xpor
dc.identifier.urihttp://hdl.handle.net/1822/13766-
dc.description.abstractHydrogenated nanocrystalline silicon thin films were prepared by RF magnetron sputtering. Different bias fields (no bias–no ground, grounded and negative bias) were applied to the substrate. The effect of the ion bombardment on the structure, chemical composition and optical property were studied by Raman spectroscopy, X-ray diffraction, Rutherford backscattering (RBS) and optical transmission spectroscopy. The deposition rate and the optical bandgap decrease as the bias voltage increases from 0 to -50 V. The structural characterization indicates that compressive stress is developed in plane and tensile stress is induced in the growth direction. No significant variation on the chemical composition was observed.por
dc.description.sponsorshipFCT Project POCTI/CTM/ 39395/2001por
dc.description.sponsorshipINTAS Project #03-51-6486por
dc.language.isoengpor
dc.publisherElsevierpor
dc.rightsopenAccesspor
dc.subjectnc-Sipor
dc.subjectStresspor
dc.subjectOptical propertiespor
dc.subjectThin filmspor
dc.titleThe influence of electric field on the microstructure of nc-Si:H films produced by RF magnetron sputteringpor
dc.typearticlepor
dc.peerreviewedyespor
dc.relation.publisherversionhttp://www.sciencedirect.com/science/article/pii/S0042207X08001371por
sdum.publicationstatuspublishedpor
oaire.citationStartPage1433por
oaire.citationEndPage1436por
oaire.citationIssue12por
oaire.citationTitleVacuumpor
oaire.citationVolume82por
dc.identifier.doi10.1016/j.vacuum.2008.03.054por
dc.subject.wosScience & Technologypor
sdum.journalVacuumpor
Appears in Collections:CDF - FMNC - Artigos/Papers (with refereeing)

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