Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/11945

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dc.contributor.authorCosta, Manuel F. M.-
dc.contributor.authorTeixeira, Vasco M. P.-
dc.date.accessioned2011-03-23T16:16:09Z-
dc.date.available2011-03-23T16:16:09Z-
dc.date.issued2011-03-
dc.date.submitted2010-07-
dc.identifier.citation"Measurement." ISSN 0263-2241. 44:3 (Mar. 2011) 549-553.por
dc.identifier.issn0263-2241por
dc.identifier.urihttp://hdl.handle.net/1822/11945-
dc.description.abstractResidual stress in optical plasma vapor deposited coatings must be carefully measured. The topographic inspection of the coatings’ surface at microlevel allows the assessment of its residual stress. In the present work we will report on the optical non-destructive and non-invasive microtopographic inspection of WO3 PVD thin films for residual stress evaluation. The MICROTOP.06.MFC system, an active optical triangulation sensor developed at the Universidade do Minho, was employed. It allows depth resolutions down to 2 nm and lateral resolutions down to 1 μm. The three dimensional coordinate set obtained on the inspection allow the calculation of the stress distribution over the film.por
dc.language.isoengpor
dc.publisherElsevierpor
dc.rightsopenAccesspor
dc.subjectResidual stresspor
dc.subjectMicrotopographypor
dc.subjectThin filmspor
dc.subjectPVDpor
dc.subjectWO3por
dc.subjectTriangulationpor
dc.titleResidual stress measurement in PVD optical coatings by microtopographypor
dc.typearticlepor
dc.peerreviewedyespor
dc.relation.publisherversionhttp://www.sciencedirect.com/por
sdum.publicationstatuspublishedpor
oaire.citationStartPage549por
oaire.citationEndPage553por
oaire.citationIssue3por
oaire.citationTitleMeasurementpor
oaire.citationVolume44por
dc.identifier.doi10.1016/j.measurement.2010.11.010por
dc.subject.wosScience & Technologypor
sdum.journalMeasurementpor
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