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https://hdl.handle.net/1822/55126
Título: | Investigations on magnetron sputtered tantalum oxynitride thin films |
Autor(es): | Cristea, D. Cunha, L. Patru, M. Munteanu, D. |
Palavras-chave: | Tantalum oxynitride Thin film Sputtering Microstructure |
Data: | 2015 |
Citação: | D. Cristea, L. Cunha, M. Pătru, D. Munteanu, Investigations on magnetron sputtered tantalum oxynitride thin films. Materials Science. Non-Equilibrium Phase Transformations, issue 2/2015 (2015) 30-33 |
Resumo(s): | Tantalum oxynitride thin solid films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N2 + 15% O2) but with varying partial pressures, onto silicon (100) wafer substrates. The physical integrity was observed after vacuum thermal annealing at temperatures from 100 °C to 800 °C. The structural evolution on the as deposited and annealed samples was obtained by X-ray Diffraction. For the lowest partial pressure, the crystalline structure is that of tetragonal β-Ta. Increasing the reactive gas partial pressure leads to the formation of fcc-Ta(O,N) crystals, with various orientations (111, 200, 220).The higher partial pressure films are amorphous. The thermal annealing induces a phase transformation, from tetragonal β-Ta to hexagonal TaNx (x<1). AFM measurements resulted in low RMS roughness values, regardless of the partial pressure or the annealing temperature. |
Tipo: | Artigo em ata de conferência |
URI: | https://hdl.handle.net/1822/55126 |
ISSN: | 1310-3946 |
Versão da editora: | http://mtmcongress.com/proceedngs/2015/2/09.INVESTIGATIONS%20ON%20MAGNETRON%20SPUTTERED%20TANTALUM%20OXYNITRIDE%20THIN%20FILMS.pdf |
Arbitragem científica: | yes |
Acesso: | Acesso restrito UMinho |
Aparece nas coleções: | CDF - GRF - Outros Documentos/Other Documents (without refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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24_CRISTEA_mtm15.pdf Acesso restrito! | 1,2 MB | Adobe PDF | Ver/Abrir |