Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/33983

TítuloSemiconductor layer thickness impact on optical and resistive switching behavior of pulsed laser deposited BaTiO3/ZnO heterostructures
Autor(es)Sekhar, K. C.
Silva, J. P. B.
Kamakshi, Koppole
Pereira, Mário
Gomes, M. J. M.
Data2013
EditoraAmerican Institute of Physics
RevistaApplied Physics Letters
Resumo(s)This work reports the impact of ZnO layer thickness on optical and resistive switching behavior of BaTiO3/ZnO heterostructures grown by pulsed laser deposition. The interface polarization coupling becomes more efficient and causes a remarkable change in heterostructure properties with decrease in ZnO layer thickness. The heterostructure with ZnO thickness of 25 nm displays the enhanced resistive switching characteristics with switching ratio ≈106 and good stability in low and high resistance states. Moreover, the photoluminescence spectrum exhibits two additional blue emissions when ZnO thickness is ≤50 nm and their mechanism is highlighted based on interface band offset and interface polarization coupling effect.
TipoArtigo
URIhttps://hdl.handle.net/1822/33983
DOI10.1063/1.4809531
ISSN0003-6951
Arbitragem científicayes
AcessoAcesso restrito UMinho
Aparece nas coleções:CDF - FMNC - Artigos/Papers (with refereeing)


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