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DataTítuloAutor(es)TipoAcesso
2004Raman analysis of Si–C–N films grown by reactive magnetron sputteringLiang, E. J.; Zhang, J. W.; Leme, J., et al.ArtigoAcesso aberto
2006Raman spectra and structural analysis in ZrOxNy thin filmsMoura, C.; Carvalho, P.; Vaz, F., et al.ArtigoAcesso aberto
2011Revestimentos decorativos pelo efeito SPR obtido pela adição de Au a matrizes dieléctricasFigueiredo, N. M.; Vaz, F.; Cunha, L., et al.ArtigoAcesso aberto
2011Si doped and undoped chromium nitride coatings: a comparative study of physical propertiesCunha, L.; Moura, C.Resumo em ata de conferência Acesso aberto
Jan-2011Structural and optical properties of Ag: TiO2 nanocomposite films prepared by magnetron sputteringAdochite, R.; Torrell, M.; Cunha, L., et al.ArtigoAcesso aberto
2015Structural, mechanical and piezoelectric properties of polycrystalline AlN films sputtered on titanium bottom electrodesPătru, M.; Isac, L.; Cunha, L., et al.ArtigoAcesso restrito UMinho
31-Out-2011Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin filmsChappé, J. M.; Marco de Lucas, M. C.; Cunha, L., et al.ArtigoAcesso aberto
10-Jul-2015Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputteringCristea, D.; Crisan, A.; Cretu, N., et al.ArtigoAcesso restrito UMinho
2009Study on the thermal stability of Ti(C,O,N) decorative coatingsMoura, C.; Cunha, L.; Chappé, J. M., et al.ArtigoAcesso aberto
26-Jul-2012Surface plasmon resonance effect on the optical properties of TiO2 doped by noble metals nanoparticlesTorrell, M.; Adochite, R. C.; Cunha, L., et al.ArtigoAcesso restrito UMinho
23-Mar-2019Tantalum oxynitride thin films: Assessment of the photocatalytic efficiency and antimicrobial capacityCristea, Daniel; Cunha, Luís; Gabor, Camelia, et al.ArtigoAcesso aberto
2014Tantalum oxynitride thin films: mechanical properties and wear behavior dependence on growth conditionsCristea, D.; Crisan, A.; Munteanua, D., et al.ArtigoAcesso restrito UMinho
2022Tantalum-titanium oxynitride thin films deposited by DC reactive magnetronic co-sputtering: mechanical, optical, and electrical characterizationCristea, Daniel; Velicu, Ioana-Laura; Cunha, L., et al.ArtigoAcesso aberto
Jun-2021The effect of vacuum and air annealing in the physical characteristics and photocatalytic efficiency of In2S3:Ag thin films produced by spray pyrolysisTiss, B.; Benfraj, M.; Bouguila, N., et al.ArtigoAcesso restrito UMinho
7-Mai-2022The effects of annealing process on the characteristics of β-In2S3 powder in pellet formTimoumi, A.; Tiss, Belgacem; Zayoud, W., et al.ArtigoAcesso restrito UMinho
2009The role of modulated IR radiometry measurements in the characterization of Zr-O-N thin filmsMacedo, Francisco; Carvalho, Pedro; Cunha, L., et al.ArtigoAcesso aberto
2018Thermal stability of Zr-O-N(:Ti) thin films prepared by magnetron sputteringOliveira, Catarina Isabel Silva; Martínez Martinez, Diego; Apreutesei, M., et al.ArtigoAcesso restrito UMinho
Abr-2008TiN-based decorative coatings : colour change by addition of C and OChappé, J. M.; Fernandes, Ana C.; Cunha, L., et al.ArtigoAcesso aberto
2010Ti–Si–C thin films produced by magnetron sputtering : correlation between physical properties, mechanical properties and tribological behaviorCunha, L.; Vaz, F.; Moura, C., et al.ArtigoAcesso aberto
Jun-2005Tribocorrosion behaviour of zrNxOy thin films for decorative applicationsFerreira, S. C.; Ariza, E.; Rocha, L. A., et al.Resumo em ata de conferência Acesso aberto