Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/62674

TítuloStructural and Electrical Properties of Nanostructured Ba<sub>0.8</sub>Sr<sub>0.2</sub>TiO<sub>3</sub> Films Deposited by Pulsed Laser Deposition
Autor(es)Silva, José Pedro Basto
Rodrigues, S.A.S.
Khodorov, Anatoli
Martín-Sánchez, J.
Pereira, M.
Alves, E.
Gomes, M. J. M.
Colomban, Philippe
Palavras-chaveStructure
Electrical Properties
Pulsed Laser Ablation
BST Thin films
Data2012
EditoraTrans Tech Publications Ltd
RevistaJournal of Nano Research
Resumo(s)Barium Strontium Titanate Ba0.8Sr0.2TiO3 (BST) thin films have been deposited on Pt/Ti/SiO2/Si substrates by pulsed laser deposition technique. The X-ray diffraction (XRD) shows that the films crystallize in a perovskite phase. XRD and Atomic Force Microscopy (AFM) characterization reveal that the grains are nano-sized. Rutherford Backscattering Spectrometry (RBS) analysis shows the stoichiometry of the films to be close to the stoichiometry of the target. The Raman spectroscopy shows that the films exhibit the tetragonal structure by the presence of the Raman active modes at 301 cm(-1) and 729 cm(-1), at room temperature. Leakage current measurements of Au/ Ba0.8Sr0.2TiO3/Pt capacitors have been done, at room temperature, to investigate the conduction mechanisms of the films. We found that there are two different conduction regions in the capacitors, namely, an ohmic behavior at low voltages and a Schottky emission mechanism at high voltages. The Schottky barrier height has been estimated to be 0.99 eV.
TipoArtigo
URIhttps://hdl.handle.net/1822/62674
DOI10.4028/www.scientific.net/JNanoR.18-19.299
ISSN1662-5250
e-ISSN1661-9897
Versão da editorahttps://www.scientific.net/JNanoR.18-19.299
Arbitragem científicayes
AcessoAcesso restrito UMinho
Aparece nas coleções:CDF - FMNC - Artigos/Papers (with refereeing)

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