Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/9051

TitleXRD and FTIR analysis of Ti–Si–C–ON coatings for biomedical applications
Author(s)Oliveira, Cristina
Gonçalves, L. M.
Almeida, B. G.
Tavares, C. J.
Carvalho, S.
Vaz, F.
Escobar Galindo, R.
Henriques, Mariana
Susano, M.
Oliveira, Rosário
KeywordsSputtering
FTIR
Resistivity
Biofilm formation
Issue dateDec-2008
PublisherElsevier B.V.
JournalSurface and Coatings Technology
Citation“Surface & Coatings Technology”. ISSN 0257-8972. 203:5-7 (2008) 490-494.
Abstract(s)Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure ratio of oxygen (pO2) and nitrogen (pN2). Compositional analysis revealed the existence of three different growth zones for the films; (I) N/Ti = 2.1 (high atomic ratio) and low oxygen content; (II) 0.76 < N/Ti < 2.1 (intermediate atomic ratio) and (III) N/Ti ≤ 0.12 (low ratio) and high oxygen content. For high N/Ti atomic ratio (N/Ti = 2.1) the XRD pattern exhibits reflections that correspond to a mixture of two different phases: a metallic-like Ti and a fcc NaCl type structure. Its electrical resistivity presents a metallic character and, consequently, has high infrared reflectivity. For the intermediate N/Ti ratio (0.76 < N/Ti < 2.1), the films crystallize in a B1-NaCl crystal structure typical for TiC0.2N0.8. Their FTIR spectra present C–N modes, besides the TiN ones, that indicate a progressive substitution of nitrogen by carbon atoms with increasing oxygen content (and lowering N/Ti ratio). For the highest oxygen content (and lower N/Ti ratio) the presence of the Ti–O–Ti stretching mode shows the formation of highly resistive Ti–O compounds consistent with the semiconductor character of this film. Biofilm formation as well as material cytotoxicity seemed to be related with the presence of the Ti.
TypeArticle
URIhttp://hdl.handle.net/1822/9051
DOI10.1016/j.surfcoat.2008.06.121
ISSN0257-8972
Publisher versionhttp://dx.doi.org/10.1016/j.surfcoat.2008.06.121
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CAlg - Artigos em revistas internacionais/Papers in international journals
CEB - Publicações em Revistas/Séries Internacionais / Publications in International Journals/Series
CDF - OCV - Artigos/Papers (with refereeing)
DEI - Artigos em atas de congressos internacionais

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