Utilize este identificador para referenciar este registo: http://hdl.handle.net/1822/9051

TítuloXRD and FTIR analysis of Ti–Si–C–ON coatings for biomedical applications
Autor(es)Oliveira, Cristina
Gonçalves, L. M.
Almeida, B. G.
Tavares, C. J.
Carvalho, S.
Vaz, F.
Escobar Galindo, R.
Henriques, Mariana
Susano, M.
Oliveira, Rosário
Palavras-chaveSputtering
FTIR
Resistivity
Biofilm formation
DataDez-2008
EditoraElsevier B.V.
RevistaSurface and Coatings Technology
Citação“Surface & Coatings Technology”. ISSN 0257-8972. 203:5-7 (2008) 490-494.
Resumo(s)Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure ratio of oxygen (pO2) and nitrogen (pN2). Compositional analysis revealed the existence of three different growth zones for the films; (I) N/Ti = 2.1 (high atomic ratio) and low oxygen content; (II) 0.76 < N/Ti < 2.1 (intermediate atomic ratio) and (III) N/Ti ≤ 0.12 (low ratio) and high oxygen content. For high N/Ti atomic ratio (N/Ti = 2.1) the XRD pattern exhibits reflections that correspond to a mixture of two different phases: a metallic-like Ti and a fcc NaCl type structure. Its electrical resistivity presents a metallic character and, consequently, has high infrared reflectivity. For the intermediate N/Ti ratio (0.76 < N/Ti < 2.1), the films crystallize in a B1-NaCl crystal structure typical for TiC0.2N0.8. Their FTIR spectra present C–N modes, besides the TiN ones, that indicate a progressive substitution of nitrogen by carbon atoms with increasing oxygen content (and lowering N/Ti ratio). For the highest oxygen content (and lower N/Ti ratio) the presence of the Ti–O–Ti stretching mode shows the formation of highly resistive Ti–O compounds consistent with the semiconductor character of this film. Biofilm formation as well as material cytotoxicity seemed to be related with the presence of the Ti.
Tipoarticle
URIhttp://hdl.handle.net/1822/9051
DOI10.1016/j.surfcoat.2008.06.121
ISSN0257-8972
Versão da editorahttp://dx.doi.org/10.1016/j.surfcoat.2008.06.121
Arbitragem científicayes
AcessoopenAccess
Aparece nas coleções:CEB - Publicações em Revistas/Séries Internacionais / Publications in International Journals/Series
CAlg - Artigos em revistas internacionais/Papers in international journals
DEI - Artigos em atas de congressos internacionais
CDF - OCV - Artigos/Papers (with refereeing)

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