Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/6993

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dc.contributor.authorMarques, L.-
dc.contributor.authorJolly, Jacques-
dc.contributor.authorAlves, L. L.-
dc.date.accessioned2007-10-11T19:18:26Z-
dc.date.available2007-10-11T19:18:26Z-
dc.date.issued2007-09-
dc.identifier.citation"Journal of Applied Physics". ISSN 0021-8979.102:6 (Sept. 2007) 1-14.eng
dc.identifier.issn0021-8979eng
dc.identifier.urihttp://hdl.handle.net/1822/6993-
dc.description.abstractThis paper presents a systematic characterization of capacitively coupled radio-frequency hydrogen, discharges, produced within a parallel plate cylindrical setup at different rf applied voltages (Vrf=50–600 V), frequencies (f =13.56–40.68 MHz), and pressures (p=0.2–1 torr). A two-dimensional, time-dependent fluid model for charged particle transport is self-consistently solved coupled to a homogeneous kinetic model for hydrogen, including vibrationally excited molecular species and electronically excited atomic species. Numerical simulations are compared with experimental measurements of various plasma parameters. A good quantitative agreement is found between simulations and experiment for the coupled electrical power and the plasma potential. The model underestimates the values of the electron density, the self-bias potential, and the H(n=1) atom density with respect to measurements, but agrees with experiment when predicting that all these parameters increase with either Vrf, f, or p. The dissociation degree is about 10^−3 for the work conditions considered. Simulations adopt a wall recombination probability for H atoms that was experimentally measured, thus accounting for surface modification with discharge operating conditions. Results show the key role played by the atomic wall recombination mechanism in plasma description.eng
dc.language.isoengeng
dc.publisherAIP Publishingeng
dc.rightsopenAccesseng
dc.titleCapacitively coupled radio-frequency hydrogen discharges : the role of kineticseng
dc.typearticlepor
dc.peerreviewedyespor
sdum.number6eng
sdum.pagination1-14eng
sdum.publicationstatuspublishedeng
sdum.volume102eng
oaire.citationIssue6por
oaire.citationVolume102por
dc.identifier.doi10.1063/1.2779268por
dc.subject.wosScience & Technologypor
sdum.journalJournal of Applied Physicspor
Appears in Collections:CDF - FCT - Artigos/Papers (with refereeing)

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