Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/68889

TítuloN2-H2 capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: The relevance of plasma-surface interaction
Autor(es)Jiménez-Redondo, Miguel
Chatain, Audrey
Guaitella, Olivier
Cernogora, Guy
Carrasco, Nathalie
Alves, Luis Lemos
Marques, L.
Palavras-chaveCcp discharge
Cold plasma
Modeling
N2 h2 mixture
Plasma surface interactions
Data2020
EditoraIOP Publishing
RevistaPlasma Sources Science & Technology
Resumo(s)In this work, we present the results of simulations carried out for N2-H2 capacitively coupled radio-frequency discharges, running at low pressure (0.3-0.9 mbar), low power (5-20 W), and for amounts of H2 up to 5%. Simulations are performed using a hybrid code that couples a two-dimensional time-dependent fluid module, describing the dynamics of the charged particles in the discharge, to a zero-dimensional kinetic module, that solves the Boltzmann equation and describes the production and destruction of neutral species. The model accounts for the production of several vibrationally and electronic excited states, and contains a detailed surface chemistry that includes recombination processes and the production of NH x molecules. The results obtained highlight the relevance of the interactions between plasma and surface, given the role of the secondary electron emission in the electrical parameters of the discharge and the critical importance of the surface production of ammonia to the neutral and ionic chemistry of the discharge.
TipoArtigo
URIhttps://hdl.handle.net/1822/68889
DOI10.1088/1361-6595/ab9b1b
ISSN0963-0252
Versão da editorahttps://iopscience.iop.org/article/10.1088/1361-6595/ab9b1b
Arbitragem científicayes
AcessoAcesso aberto
Aparece nas coleções:CDF - FCT - Artigos/Papers (with refereeing)

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