Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/61329

TitleNb-doped Ti2O3 films deposited through grid-assisted magnetron sputtering on glass substrate: electrical and optical analysis
Author(s)Stryhalski, Joel
Duarte, Diego Alexandre
Rebouta, L.
Sagás, Julio César
Tavares, C. J.
Fontana, Luis Cesar
KeywordsDititanium trioxide Ti2O3
Niobium doping
electrical conductivity
substrate bias
grid-assisted sputtering
Dititanium trioxide Ti O 2 3
Issue date24-Jan-2019
PublisherUniversidade Federal de São Carlos (UFSCar)
JournalMaterials Research
Abstract(s)Niobium doped dititanium trioxide (Ti2O3:Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti2O3:Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti2O3. No niobium oxide NbxOy peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti2O3:Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).
TypeArticle
URIhttp://hdl.handle.net/1822/61329
DOI10.1590/1980-5373-mr-2018-0524
ISSN1516-1439
e-ISSN1980-5373
Publisher versionhttp://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392019000200218&tlng=en
Peer-Reviewedyes
AccessOpen access
Appears in Collections:FUNCTIONAL AND SMART MATERIALS AND SURFACES FOR ADVANCED APPLICATIONS (2018 - ...)

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