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|Title:||Application of the photoacoustic technique to the determination of the thickness of multilayer films produced by magnetron sputtering|
|Author(s):||Ramos, Marta M. D.|
Ferreira, J. A.
dos Santos, M. P.
|Publisher:||Pergamon-Elsevier Science Ltd|
|Abstract(s):||Multilayer thin films consisting of alternate layers of metal and oxide have been prepared by magnetron sputtering. The films have been studied by optical and photoacoustic spectroscopy (PAS) and thicknesses determined from the interference patterns. The non-destructive PAS technique gives reliable results for dielectric layers thicker than about 100 nm.|
|Appears in Collections:||CDF - FCT - Artigos/Papers (with refereeing)|