Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/59219

TitleApplication of the photoacoustic technique to the determination of the thickness of multilayer films produced by magnetron sputtering
Author(s)Ramos, Marta M. D.
Ferreira, J. A.
Isabel, M.
Ferreira, C.
dos Santos, M. P.
Issue date1989
PublisherPergamon-Elsevier Science Ltd
JournalVacuum
Abstract(s)Multilayer thin films consisting of alternate layers of metal and oxide have been prepared by magnetron sputtering. The films have been studied by optical and photoacoustic spectroscopy (PAS) and thicknesses determined from the interference patterns. The non-destructive PAS technique gives reliable results for dielectric layers thicker than about 100 nm.
TypeArticle
URIhttp://hdl.handle.net/1822/59219
DOI10.1016/0042-207X(89)90026-2
ISSN0042-207X
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FCT - Artigos/Papers (with refereeing)

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