Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/5763

TitleRaman spectra and structural analysis in ZrOxNy thin films
Author(s)Moura, C.
Carvalho, P.
Vaz, F.
Cunha, L.
Alves, E.
KeywordsSputtering
Zirconium oxynitride
Raman
X-ray diffraction
Decorative coatings
Issue date2006
PublisherElsevier
JournalThin solid films
Citation"Thin solid films". ISSN 0040-6090. 515:3 (2006) 1132-1137.
Abstract(s)Raman spectroscopy has been used as a local probe to characterize the structural evolution of magnetron-sputtered decorative zirconium oxynitride ZrOxNy films which result from an increase of reactive gas flow in the deposition The lines shapes, the frequency position and widths of the Raman bands show a systematic change as a function of the reactive gas flow (a mixture of both oxygen and nitrogen). The as-deposited zirconium nitride film presents a Raman spectrum with the typical broadened bands, due to the disorder induced by N vacancies. The recorded Raman spectrum of the zirconium oxide film is typical of the monoclinic phase of ZrO2, which is shown also by X-ray diffraction. Raman spectra of zirconium oxynitride thin films present changes, which are found to be closely related with the oxygen content in films and the subsequent structural changes.
TypeArticle
URIhttp://hdl.handle.net/1822/5763
DOI10.1016/j.tsf.2006.07.039
ISSN0040-6090
Publisher versionwww.elsevier.com
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FMNC - Artigos/Papers (with refereeing)
CDF - GRF - Artigos/Papers (with refereeing)

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