Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/39867

TitleStudy of the electrical behavior of nanostructured Ti–Ag thin films, prepared by glancing angle deposition
Author(s)Lopes, Cláudia Jesus Ribeiro
Pedrosa, P.
Martin, N.
Barradas, N. P.
Alves, E.
Vaz, F.
KeywordsGLancing Angle Deposition
Thin films
Intermetallic compounds
Electrical Properties
Sensing devices
Issue date15-Oct-2015
PublisherElsevier
JournalMaterials Letters
CitationLopes, C., Pedrosa, P., Martin, N., Barradas, N. P., Alves, E., & Vaz, F. (2015). Study of the electrical behavior of nanostructured Ti-Ag thin films, prepared by Glancing Angle Deposition. Materials Letters, 157, 188-192. doi: 10.1016/j.matlet.2015.05.067
Abstract(s)Aiming at biosignal acquisition for bioelectrodes application, Ti-Ag thin films were produced by GLAD, in order to tailor their electromechanical properties. The electrical behaviour of the sculptured Ti-Ag thin films was studied with increasing annealing temperatures. The results revealed a good correlation with the set of morphological features displayed. With the increase of the vapour flux angle, a more defined structure was obtained, as well as a more porous morphology, which increased the electrical resistivity of the coatings. An important point consists in the recrystallization of Ti-Ag intermetallic phases due to the temperature increase (between 558 K and 773 K), which resulted in a sharp decrease of the electrical resistivity values.
TypeArticle
URIhttp://hdl.handle.net/1822/39867
DOI10.1016/j.matlet.2015.05.067
ISSN0167-577X
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0167577X15007892
Peer-Reviewedyes
AccessRestricted access (UMinho)
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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