Utilize este identificador para referenciar este registo: http://hdl.handle.net/1822/27576

TítuloEffect of the microstructure on the cutting performance of superhard (Ti, Si, Al)N nanocomposite films
Autor(es)Fernandes, C.
Carvalho, S.
Rebouta, L.
Vaz, F.
Denannot, M. F.
Pacaud, J.
Rivière, J. P.
Cavaleiro, A.
Palavras-chave(Ti,Si,Al)N
Microstructure
HRTEM
XRD
Data2008
EditoraElsevier
RevistaVacuum
Resumo(s)A d.c. reactive magnetron sputtering technique was used to deposit (Ti,Si,Al)N coatings onto WC–Co cutting tools. The microstructure of the coatings was analysed using X-ray diffraction (XRD) and highresolution transmission electron microscopy (HRTEM) measurement. Before the cutting experiments, the XRD results revealed a structure indexed to an fcc TiN. The results obtained by the XRD tests, with detector variation in asymmetric mode (rocking curves) showed a decrease in the quality of the fiber texture in the (111) grains with the change on deposition chamber geometry (two magnetrons in place of four magnetrons). Cross-sectional HRTEM images of the (Ti,Al)N sample showed grains with a diameter between 16 and 30 nm, while for the (Ti,Si,Al)N samples grains with a diameter between 6 and 10 nm were observed. Furthermore, through the visualization of bright field images it was possible to discern a columnar structure. For samples prepared at high deposition rates (2 mm/h), HRTEM micrographs revealed the formation of the multilayer stacking of (Ti,Si)N/(Ti,Al)N.
Tipoarticle
URIhttp://hdl.handle.net/1822/27576
DOI10.1016/j.vacuum.2008.03.050
ISSN0042-207X
Arbitragem científicayes
AcessoopenAccess
Aparece nas coleções:CDF - GRF - Artigos/Papers (with refereeing)

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