Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/24545

TitleInfluence of composition, bonding characteristics and microstructure on the electrochemical and optical stability of AlOxNy thin films
Author(s)Borges, Joel Nuno Pinto
Fonseca, C.
Barradas, Nuno P.
Alves, Eduardo
Girardeau, Thierry
Paumier, Fabien
Vaz, F.
Marques, L.
KeywordsThin films
AlOxNy
Optical stability
Corrosion
EIS
AlO N x y
Issue dateSep-2013
PublisherElsevier
JournalElectrochimica Acta
Abstract(s)Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different structures and morphologies were observed, depending on the composition and bonding states, which opened the possibility to tailor the properties of this oxynitride system between those of pure Al and those of nitride and oxide films. In a wide range of stoichiometries, one can report the formation of nanocomposite porous films, where Al nanoparticles are dispersed in an amorphous matrix of AlOxNy. The electrochemical behaviour of the films was studied in isotonic NaCl solution. It was observed that the pitting 2 potential characteristic of aluminium disappears with the incorporation of oxygen and nitrogen in the films, being replaced by a smooth current increase. Electrochemical impedance spectroscopy performed during 35 days showed that the corrosion resistance of the films steadily increases. The unusual optical reflectance profile of some films is maintained after immersion for several months.
TypeArticle
URIhttp://hdl.handle.net/1822/24545
DOI10.1016/j.electacta.2013.05.020
ISSN0013-4686
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0013468613009249
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FCT - Artigos/Papers (with refereeing)

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