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|Title:||MPCVD diamond tool cutting-edge coverage: dependence on the side wedge angle|
|Author(s):||Fernandes, A. J. S.|
Silva, V. A.
Carrapichano, J. M.
Dias, Gustavo R.
Silva, R. F.
Costa, F. M.
|Keywords:||Chemical vapour deposition CVD|
|Journal:||Diamond and Related Materials|
|Citation:||“Diamond and Related Materials”. 10 (2001) 803-808.|
|Abstract(s):||Microwave plasma CVD usually produces uniform diamond coatings and high-quality diamond films. However, abnormal deposits appear near the sample edges - the so-called ‘edge effect’. Wedge-shaped silicon nitride inserts with 30º-, 60º-, 75º- and 90º- edge angles were vertically and horizontally exposed to MPCVD diamond coating to systematically study this effect. Finite element method (FEM) analysis was used to simulate the temperature distribution on such geometries. Diamond morphology and quality were assessed by SEM and micro-Raman techniques. The edge effect, a consequence of plasma concentration and thermal phenomena in this experimental set-up activation by electromagnetic gas discharge, is more accentuated on samples that are vertically wedge-oriented towards the plasma. A grain-size gradient is established along the exposed surface, steeply increasing at the hot edge. An extreme effect occurs in the sharpest wedge samples, avoiding diamond growth at the edge.|
|Access:||Restricted access (UMinho)|
|Appears in Collections:||IPC - Artigos em revistas científicas internacionais com arbitragem|
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