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TitleInfluence of substrate temperature and post-annealing treatment on the microstructure and electric properties of ZnO:Al thin films deposited by sputtering
Author(s)Garcia, Cibeli Navarro Belletti
Ariza, E.
Tavares, C. J.
Issue date2013
PublisherTrans Tech Publications
JournalMaterials Science Forum
Abstract(s)In this work, it is reported the characterization of the microstructure and electric properties of ZnO:Al thin films produced by magnetron sputtering. An AZOY sputtering target (98 wt% ZnO + 2 wt% Al2O3) was used as source material. The microstructure, optical and electrical properties of ZnO:Al thin films were investigated and correlated with substrate deposition temperature and post-annealing temperature. It is demonstrated that the microstructural, electrical and optical properties of the as-deposited thin films are dependent on the substrate temperature. The crystalline texture of ZnO:Al was improved with temperature deposition as shown in the EBSD analysis and X-ray diffraction. ZnO:Al thin film deposited at 250 ºC exhibited very good electrical conductivity, as high as 200 with an activation energy of 5.4 meV. As substrate temperature or heat treatment temperature is increased there is an apparent blue-shift on the absorption edge of the transmittance spectra, which can be explained by the Burnstein-Moss effect.
TypeConference paper
Publisher version
AccessRestricted access (UMinho)
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)
DEM - Artigos em revistas de circulação internacional com arbitragem científica

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