Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/21799

TitleInfluence of substrate temperature and post-annealing treatment on the microstructure and electric properties of ZnO:Al thin films deposited by sputtering
Author(s)Garcia, Cibeli Navarro Belletti
Ariza, E.
Tavares, C. J.
KeywordsZnO:Al
Sputtering
EBSD
TCO
Issue date2013
PublisherTrans Tech Publications
JournalMaterials Science Forum
Abstract(s)In this work, it is reported the characterization of the microstructure and electric properties of ZnO:Al thin films produced by magnetron sputtering. An AZOY sputtering target (98 wt% ZnO + 2 wt% Al2O3) was used as source material. The microstructure, optical and electrical properties of ZnO:Al thin films were investigated and correlated with substrate deposition temperature and post-annealing temperature. It is demonstrated that the microstructural, electrical and optical properties of the as-deposited thin films are dependent on the substrate temperature. The crystalline texture of ZnO:Al was improved with temperature deposition as shown in the EBSD analysis and X-ray diffraction. ZnO:Al thin film deposited at 250 ºC exhibited very good electrical conductivity, as high as 200 S.cm-1 with an activation energy of 5.4 meV. As substrate temperature or heat treatment temperature is increased there is an apparent blue-shift on the absorption edge of the transmittance spectra, which can be explained by the Burnstein-Moss effect.
TypeConference paper
URIhttp://hdl.handle.net/1822/21799
DOI10.4028/www.scientific.net/MSF.730-732.215
ISSN0255-5476
Publisher versionhttp://www.scientific.net/MSF.730-732.215
Peer-Reviewedyes
AccessRestricted access (UMinho)
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)
DEM - Artigos em revistas de circulação internacional com arbitragem científica

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