Optical properties of AlNxOy thin films deposited by DC magnetron sputtering

Abstract

The main purpose of the present work is to study the variation of the optical properties of the AlNxOy thin films as a function of their compositional, morphological and structural variations. The films were deposited by DC magnetron sputtering, with the discharge parameters monitored during the deposition in order to control the chemical composition. Combining both aluminium oxide and nitride properties by tailoring the concentrations of the three elements, the Al-N-O system offers the possibility to obtain a wide range of optical responses, thus opening a significant number of possible applications. Preliminary results revealed a smooth transition between metallic and insulating-type behavior, which can be tailored according to the application that is envisaged.