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Item hits: Results 1-10 of 36 (Search time: 0.0 seconds).
Issue DateTitleAuthor(s)TypeAccess
2009Structural and photoluminescence studies of erbium implanted nanocrystalline silicon thin filmsCerqueira, M. F.; Alpuim, P.; Filonovich, Sergej; Alves, E.; Rolo, Anabela G.; Andrês, G.; Soares, J.; Kozanecki, A.ArticleOpen access
Aug-2006Thermoelectric microstructures of Bi2Te3/Sb2Te3 for a self-calibrated micropyrometerGonçalves, L. M.; Couto, Carlos; Correia, J. H.; Alpuim, P.; Rowe, D. M.ArticleOpen access
2006Optimization of deposition parameters for thin silicon films on flexible substrates in a hot-wire chemical vapor deposition reactorAlpuim, P.; Ribeiro, M.; Filonovich, SergejConference paperOpen access
Sep-2001Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor depositionAlpuim, P.; Chu, V.; Conde, J. P.ArticleOpen access
15-Sep-2012FEM numerical analysis of excimer laser induced modification in alternating multi-layers of amorphous and nano-crystalline silicon filmsConde, J. C.; Martín, E.; Stefanov, S.; Chiussi, S.; Alpuim, P.ArticleOpen access
3-Aug-2013The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layersMajee, Subimal; Cerqueira, M. F.; Tondelier, D.; Geffroy, B.; Bonnassieux, Y.; Alpuim, P.; Bourée, J. E.ArticleOpen access
17-Apr-2013Study on excimer laser irradiation for controlled dehydrogenation and crystallization of boron doped hydrogenated amorphous/nanocrystalline silicon multilayersGontad, F.; Filonovich, Sergej; Cerqueira, M. F.; Alpuim, P.; Chiussi, StefanoArticleOpen access
1-Apr-2002Electronic transport in low-temperature silicon nitrideAlpuim, P.; Ferreira, P.; Chu, V.; Conde, J. P.ArticleOpen access
May-2000Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor depositionAlpuim, P.; Chu, V.; Conde, J. P.ArticleOpen access
Jul-2003Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor depositionAlpuim, P.; Chu, V.; Conde, J. P.ArticleOpen access