Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/13970
Título: | Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering |
Autor(es): | Thaiyalnayaki, V. Cerqueira, M. F. Macedo, Francisco Ferreira, J. A. |
Palavras-chave: | Nanocrystalline silicon Thermal properties Structure |
Data: | 2006 |
Editora: | Trans Tech Publications |
Revista: | Materials Science Forum |
Resumo(s): | Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters |
Tipo: | Artigo em ata de conferência |
URI: | https://hdl.handle.net/1822/13970 |
ISBN: | 9780878494026 |
ISSN: | 0255-5476 |
Versão da editora: | http://www.scientific.net/MSF.514-516.23 |
Arbitragem científica: | yes |
Acesso: | Acesso aberto |
Aparece nas coleções: | CDF - CEP - Artigos/Papers (with refereeing) CDF - FMNC - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
---|---|---|---|---|
TF-Si-MSF2006.pdf | Documento principal | 135,7 kB | Adobe PDF | Ver/Abrir |