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|Title:||Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering|
Cerqueira, M. F.
Ferreira, J. A.
|Publisher:||Trans Tech Publications|
|Journal:||Materials Science Forum|
|Abstract(s):||Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters|
|Appears in Collections:||CDF - CEP - Artigos/Papers (with refereeing)|
CDF - FMNC - Artigos/Papers (with refereeing)
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|TF-Si-MSF2006.pdf||Documento principal||135,7 kB||Adobe PDF||View/Open|