Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13970

TitleMicrostrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering
Author(s)Thaiyalnayaki, V.
Cerqueira, M. F.
Macedo, Francisco
Ferreira, J. A.
KeywordsNanocrystalline silicon
Thermal properties
Structure
Issue date2006
PublisherTrans Tech Publications
JournalMaterials Science Forum
Abstract(s)Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters
TypeConference paper
URIhttp://hdl.handle.net/1822/13970
ISBN9780878494026
ISSN0255-5476
Publisher versionhttp://www.scientific.net/MSF.514-516.23
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - CEP - Artigos/Papers (with refereeing)
CDF - FMNC - Artigos/Papers (with refereeing)

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