Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13841

TitleEffect of thermal treatments on the structure of MoNxOy thin films
Author(s)Cunha, L.
Rebouta, L.
Vaz, F.
Staszuk, M.
Malara, S.
Barbosa, J.
Carvalho, P.
Alves, E.
Le Bourhis, E.
Goudeau, Ph.
Rivière, J. P.
KeywordsMoNxOy
Structure
Annealing
MoN O x y
Issue date8-Aug-2008
PublisherElsevier
JournalVacuum
Abstract(s)MoNxOy films were deposited on steel substrates by dc reactive magnetron sputtering. The depositions were carried out from a pure molybdenum target, varying the flow rate of reactive gases. X-ray diffraction (XRD) results revealed the occurrence of cubic MoNx and hexagonal (d-MoN) phases for the films with high nitrogen flow rates. The increase of oxygen content induces the decrease of the grain size of the molybdenum nitride crystallites. The thermal stability of a set of samples was studied in vacuum, for an annealing time of 1 h, for temperatures ranging from 500 to 800 C in 100 C steps. The results showed that pure molybdenum nitride films changed their structure from a meta-stable cubic MoN to hexagonal d-MoN and cubic g-Mo2N-type structures with increasing annealing temperatures. The samples with molybdenum nitride films evidenced a good thermal stability, but those with molybdenum oxynitride coatings showed a tendency to detach with the increase of the annealing temperature.
Typearticle
DescriptionArticle in Press
URIhttp://hdl.handle.net/1822/13841
DOI10.1016/j.vacuum.2008.03.015
ISSN0042-207X
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0042207X0800136X
Peer-Reviewedyes
AccessopenAccess
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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