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|Title:||Effect of thermal treatments on the structure of MoNxOy thin films|
Le Bourhis, E.
Rivière, J. P.
MoN O x y
|Abstract(s):||MoNxOy films were deposited on steel substrates by dc reactive magnetron sputtering. The depositions were carried out from a pure molybdenum target, varying the flow rate of reactive gases. X-ray diffraction (XRD) results revealed the occurrence of cubic MoNx and hexagonal (d-MoN) phases for the films with high nitrogen flow rates. The increase of oxygen content induces the decrease of the grain size of the molybdenum nitride crystallites. The thermal stability of a set of samples was studied in vacuum, for an annealing time of 1 h, for temperatures ranging from 500 to 800 C in 100 C steps. The results showed that pure molybdenum nitride films changed their structure from a meta-stable cubic MoN to hexagonal d-MoN and cubic g-Mo2N-type structures with increasing annealing temperatures. The samples with molybdenum nitride films evidenced a good thermal stability, but those with molybdenum oxynitride coatings showed a tendency to detach with the increase of the annealing temperature.|
|Description:||Article in Press|
|Appears in Collections:||CDF - GRF - Artigos/Papers (with refereeing)|
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