Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13774

TitleThe annealing effect on structural and optical properties of ZnO thin films produced by RF sputtering
Author(s)Rolo, Anabela G.
Campos, J. Ayres de
Viseu, T. M. R.
Arôso, T. de Lacerda
Cerqueira, M. F.
KeywordsZnO
Thin films
X-ray
Raman
Stress
Issue date2007
PublisherElsevier
JournalSuperlattices and Microstructures
Abstract(s)In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated.
TypeArticle
URIhttp://hdl.handle.net/1822/13774
DOI10.1016/j.spmi.2007.04.069
ISSN0749-6036
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0749603607001036
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FMNC - Artigos/Papers (with refereeing)

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