Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13772

TitleVisible and infrared photoluminescence from erbium-doped silicon nanocrystals produced by rf sputtering
Author(s)Cerqueira, M. F.
Losurdo, M.
Monteiro, T.
Stepikhova, M.
Soares, Manuel Jorge
Peres, M.
Alpuim, P.
KeywordsErbium-doped
Low-dimensional Si films
Optical properties
Spectroscopic ellipsometry
Issue date2007
PublisherWiley-VCH Verlag
JournalPhysica Status Solidi A
Abstract(s)Erbium-doped low-dimensional Si films with different microstructures were deposited by reactive magnetron sputtering on glass substrates by varying the hydrogen flow rate during deposition. Amorphous, micro- and nanocrystalline samples, consisting of Si nanocrystalls embedded in silicon-based matrices with different structures, were achieved with optical properties in the visible and IR depending on nanocrystalline fraction and matrix structure and chemical composition. Structural characterization was performed by X-ray diffraction in the grazing incidence geometry and Raman spectroscopy. The chemical composition was studied using RBS/ERD techniques. Spectroscopic ellipsometry was combined with the previous techniques to further re-solve the film microstructure and composition. In particular, the distribution along the film thickness of the volume fractions of nanocrystalline/amorphous silicon and SiOx phases has been obtained. In this contribution we discuss visible and infrared photoluminescence as a function of sample microstructure and of the oxygen/ hydrogen concentration ratio present in the matrix.
TypeArticle
URIhttp://hdl.handle.net/1822/13772
DOI10.1002/pssa.200675350
ISSN1862-6300
Publisher versionhttp://onlinelibrary.wiley.com/doi/10.1002/pssa.200675350/pdf
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FMNC - Artigos/Papers (with refereeing)

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