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dc.contributor.authorWang Li-Wei-
dc.contributor.authorMeng Lijian-
dc.contributor.authorTeixeira, Vasco M. P.-
dc.contributor.authorSong Shigeng-
dc.contributor.authorXu Zheng-
dc.contributor.authorXu Xu-Rong-
dc.description.abstractA series of ZnO thin films doped with various vanadium concentrations were prepared on glass substrates by direct current reactive magnetron sputtering. The results of the X-ray diffraction (XRD) show that the films with doping concentration less than 10 at.% have a wurtzite structure and grow mainly along the c-axis orientation. The residual stress, estimated by fitting the XRD diffraction peaks, increases with the doping concentration and the grain size also has been calculated from the XRD results, decreases with increasing the doping concentration. The surface morphology of the ZnO:V thin films was examined by SEM. The optical constants (refractive index and extinction coefficient) and the film thickness have been obtained by fitting the transmittance. The optical band gap changed from 3.12 eV to 3.60 eV as doping concentration increased from 1.8 at.% to 13 at.% mol. All the results have been discussed in relation with doping concentrationpor
dc.description.sponsorshipThe authors express their thanks to the NSFC (60576016 and 10774013), 863 program (2006AA03Z0412), BNSFC (2073030), 973 Program (2003CB314707), Key program of NSFC(10434030) and FBJTU (2005SM057 and 2006XM043) and Beijing Jiao Tong University Doctor Science Creative Grants No. 48027.por
dc.subjectV-doped ZnOpor
dc.subjectMagnetron sputteringpor
dc.subjectOptical propertiespor
dc.titleStructure and optical properties of ZnO:V thin films with different doping concentrationpor
oaire.citationTitleThin Solid Filmspor
dc.subject.wosScience & Technologypor
sdum.journalThin Solid Filmspor
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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