Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13627

TitleStructure and optical properties of ZnO:V thin films with different doping concentration
Author(s)Wang Li-Wei
Meng Lijian
Teixeira, Vasco M. P.
Song Shigeng
Xu Zheng
Xu Xu-Rong
KeywordsV-doped ZnO
Magnetron sputtering
Optical properties
Issue dateMay-2009
PublisherElsevier
JournalThin Solid Films
Abstract(s)A series of ZnO thin films doped with various vanadium concentrations were prepared on glass substrates by direct current reactive magnetron sputtering. The results of the X-ray diffraction (XRD) show that the films with doping concentration less than 10 at.% have a wurtzite structure and grow mainly along the c-axis orientation. The residual stress, estimated by fitting the XRD diffraction peaks, increases with the doping concentration and the grain size also has been calculated from the XRD results, decreases with increasing the doping concentration. The surface morphology of the ZnO:V thin films was examined by SEM. The optical constants (refractive index and extinction coefficient) and the film thickness have been obtained by fitting the transmittance. The optical band gap changed from 3.12 eV to 3.60 eV as doping concentration increased from 1.8 at.% to 13 at.% mol. All the results have been discussed in relation with doping concentration
TypeArticle
URIhttp://hdl.handle.net/1822/13627
DOI10.1016/j.tsf.2008.12.043
ISSN0040-6090
Publisher versionhttp://www.sciencedirect.com/science/article/pii/S0040609008016209
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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