Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13626

TitleStudy of indium tin oxide thin films deposited on acrylics substrates by Ion beam assisted deposition technique
Author(s)Meng Lijian
Liang Erjun
Gao Jinsong
Teixeira, Vasco M. P.
Santos, M. P. dos
KeywordsITO
Optical properties
Thin film
PMMA
Ion beam assisted deposition
Indium tin oxide
Issue dateJul-2009
PublisherAmerican Scientific Publishers
JournalJournal of Nanoscience and Nanotechnology
Abstract(s)Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the deposited films have been studied. It has been found that 40 sccm oxygen flow is an optimum value for getting the films with good transmittance and low electrical resistivity.
TypeArticle
URIhttp://hdl.handle.net/1822/13626
DOI10.1166/jnn.2009.M24
ISSN1533-4880
Publisher versionhttp://www.ingentaconnect.com/content/asp/jnn/2009/00000009/00000007/art00024?token=004619196b767e57a7e41225f40386f2c4b46527d763b24442a576b64276abc986af9f
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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