Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13618

TitleEffect of the deposition rate on ITO thin films properties prepared by ion beam assisted deposition (IBAD) technique
Author(s)Meng Lijian
Teixeira, Vasco M. P.
Santos, M. P. dos
KeywordsElectrical properties
Ion-assisted deposition structure
Structure
ITO
Optical properties
Issue dateJul-2010
PublisherWiley-VCH Verlag
JournalPhysica Status Solidi A
Abstract(s)Indium tin oxide (ITO) thin films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique at different deposition rates (0.1 -- 0.3 nm/s). The effects of the deposition rate on the structural, optical and electrical properties of the deposited films have been studied. The optical constants of the deposited films were calculated by fitting the transmittance spectra using the semi-quantum model. Considering the application for the electromagnetic wave shielding which needs a high IR reflectance, the optimising deposition rate is 0.2 nm/s. The films prepared at this deposition rate shows a relative high IR reflectance (60%), a good electrical conductivity (5 x 10-3 -cm), and a reasonable transmittance in the visible region (over 80%).
TypeArticle
URIhttp://hdl.handle.net/1822/13618
ISSN1862-6300
Publisher versionhttp://onlinelibrary.wiley.com/doi/10.1002/pssa.v207:7/issuetoc
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - GRF - Artigos/Papers (with refereeing)

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