Please use this identifier to cite or link to this item: http://hdl.handle.net/1822/13509

TitleOptical properties of AlNxOy thin films deposited by DC magnetron sputtering
Author(s)Borges, Joel Nuno Pinto
Alves, E.
Vaz, F.
Marques, L.
KeywordsAluminium oxynitride
DC reactive magnetron sputtering
Optical properties
Issue dateAug-2011
PublisherSociety of Photo-optical Instrumentation Engineers (SPIE)
JournalProceedings of SPIE
Abstract(s)The aluminium oxynitride system offers the possibility to obtain a wide range of optical responses, by combining metallic aluminium, aluminium oxide and aluminium nitride properties, and thus opening a significant number of possible applications. The main purpose of the present work is to study the variation of the optical properties of AlN x O y thin films as a function of their composition (by varying both x and y coefficients), and the correspondent changes in their morphology and structure. The films were deposited by DC reactive magnetron sputtering, with the discharge parameters monitored during the deposition in order to control the chemical composition. The measurements reveal a smooth change of films Reflectance/Transmittance as a function of the concentration ratio of non metallic elements (O+N) to metallic Al, thus revealing the possibility to tailor the films optical properties according to the application envisaged.
TypeConference paper
URIhttp://hdl.handle.net/1822/13509
ISBN9780819485755
DOI10.1117/12.892038
ISSN0277-786X
Peer-Reviewedyes
AccessOpen access
Appears in Collections:CDF - FCT - Artigos/Papers (with refereeing)
CDF - GRF - Artigos/Papers (with refereeing)

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