Browsing by subject Tantalum oxynitride

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Showing results 1 to 8 of 8.
Issue DateTitleAuthor(s)TypeAccess
3-Sep-2015Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parametersCristea, D.; Pătru, M.; Crisan, A., et al.ArticleRestricted access (UMinho)
25-Jun-2013Development of tantalum oxynitride thin films produced by PVD : study of structural stabilityCristea, D.; Crisan, A.; Barradas, N. P., et al.ArticleRestricted access (UMinho)
2013Electrical and photocatalytic behaviour of TAOxNy magnetron sputtered thin solid filmsCristea, D.; Crisan, A.; Barradas, N. P., et al.ArticleRestricted access (UMinho)
2018In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolutionCunha, L.; Apreutesei, M.; Moura, C., et al.ArticleRestricted access (UMinho)
2015Investigations on magnetron sputtered tantalum oxynitride thin filmsCristea, D.; Cunha, L.; Patru, M., et al.Conference paperRestricted access (UMinho)
23-Mar-2013Properties of tantalum oxynitride thin films produced by magnetron sputtering : the influence of processing parametersCristea, D.; Constantin, D. G.; Crisan, A., et al.ArticleRestricted access (UMinho)
10-Jul-2015Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputteringCristea, D.; Crisan, A.; Cretu, N., et al.ArticleRestricted access (UMinho)
2014Tantalum oxynitride thin films: mechanical properties and wear behavior dependence on growth conditionsCristea, D.; Crisan, A.; Munteanua, D., et al.ArticleRestricted access (UMinho)