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DataTítuloAutor(es)TipoAcesso
2015Biological behaviour of thin films consisting of Au nanoparticles dispersed in a TiO2 dielectric matrixBorges, Joel Nuno Pinto; Costa, D.; Antunes, E., et al.ArtigoAcesso restrito UMinho
1-Jan-1999Characterization of titanium silicon nitride films deposited by PVDVaz, F.; Rebouta, L.; da Silva, R. M. C., et al.ArtigoAcesso aberto
Nov-2001Charge induced-defects in Poly (P-Phenylene Vinylene) (PPV)Ramos, Marta M. D.; Almeida, A. M.ArtigoAcesso aberto
Mar-2019Compositional analysis by RBS, XPS and EDX of ZnO:Al,Bi and ZnO:Ga,Bi thin films deposited by d.c. magnetron sputteringRibeiro, J. M.; Correia, Filipe Costa; Salvador, Paulo Miguel Babo Cunha, et al.ArtigoAcesso restrito UMinho
Out-2020Corrigendum to “Compositional analysis by RBS, XPS and EDX of ZnO:Al,Bi and ZnO:Ga,Bi thin films deposited by d.c. magnetron sputtering” [Vacuum 161 (2019) 268–275]Ribeiro, J. M.; Correia, Filipe Costa; Salvador, Paulo Miguel Babo Cunha, et al.CorrigendaAcesso restrito UMinho
2008Effect of the microstructure on the cutting performance of superhard (Ti, Si, Al)N nanocomposite filmsFernandes, C.; Carvalho, S.; Rebouta, L., et al.ArtigoAcesso aberto
8-Ago-2008Effect of thermal treatments on the structure of MoNxOy thin filmsCunha, L.; Rebouta, L.; Vaz, F., et al.ArtigoAcesso aberto
Jun-2018Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputteringCorreia, Filipe Costa; Salvador, Paulo Miguel Babo Cunha; Ribeiro, J. M., et al.ArtigoAcesso restrito UMinho
2018Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)Correia, F. C.; Salvador, P. B.; Ribeiro, J. M., et al.CorrigendaAcesso aberto
2014Influence of hydrogen plasma thermal treatment on the properties of ZnO:Al thin films prepared by dc magnetron sputteringCastro, Maria Freire Flores Vieira; Cerqueira, M. F.; Rebouta, L., et al.ArtigoAcesso restrito UMinho
8-Ago-2008Influence of oxygen/argon pressure ratio on the morphology, optical and electrical properties of ITO thin films deposited at room temperatureCui, Hai-Ning; Teixeira, Vasco M. P.; Meng Lijian, et al.ArtigoAcesso aberto
Nov-2020Magnesium fluoride as low-refractive index material for near-ultraviolet filters applied to optical sensorsSilva, Manuel Fernando Ribeiro; Pimenta, Sara Filomena Ribeiro; Rodrigues, José Artur Oliveira, et al.ArtigoAcesso restrito UMinho
1995Microcrystalline silicon thin films prepared by RF reactive magnetron sputter depositionCerqueira, M. F.; Andritschky, M.; Rebouta, L., et al.ArtigoAcesso aberto
Dez-2015Multifunctional Ti–Me (Me=Al, Cu) thin film systems for biomedical sensing devicesLopes, Cláudia Jesus Ribeiro; Vieira, M.; Borges, Joel Nuno Pinto, et al.ArtigoAcesso restrito UMinho
6-Set-2021Nanostructured Cr(N,O) based thin films for relative humidity sensingFerreira, A.; Silva, J. P.; Correia, D. M., et al.ArtigoAcesso restrito UMinho
Dez-2013Properties of tantalum oxynitride thin films produced by magnetron sputtering: the influence of processing parametersCristea, D.; Constantin, D. G.; Crisan, A., et al.ArtigoAcesso restrito UMinho
2008Structural and magnetic properties of CoFe2O4 thin films deposited by laser ablation on Si (001) substratesAraújo, C.; Almeida, B. G.; Aguiar, M., et al.ArtigoAcesso aberto
2002Structural and optical characterization of WO3 deposited on glass and ITOMonteiro, A.; Costa, Manuel F. M.; Almeida, B. G., et al.ArtigoAcesso aberto
2009Structural evolution of Ti-Al-Si-N nanocomposite coatingCarvalho, S.; Rebouta, L.; Ribeiro, E., et al.ArtigoAcesso aberto
2008The influence of electric field on the microstructure of nc-Si:H films produced by RF magnetron sputteringThaiyalnayaki, V.; Cerqueira, M. F.; Ferreira, J. A., et al.ArtigoAcesso aberto